Samsung to Enhance Semiconductor Manufacturing with ASML High-NA EUV Lithography
Samsung is set to upgrade its semiconductor production capabilities with two High-NA EUV lithography systems from ASML, expected to be operational by the first half of 2026.
According to TrendForce, the first EXE:5200B unit will arrive at Samsung's foundry in late 2025, followed by a second unit in early 2026. The EXE:5200B is ASML's first commercially ready High-NA EUV platform, supporting volume production.
- Intel deployed prototype High-NA EUV systems in 2023.
- TSMC followed with prototype deployments in mid-2024.
- SK Hynix installed the EXE:5200B at its M16 facility for advanced DRAM production last month.
Samsung's adoption of High-NA EUV will play a central role in its 2nm process roadmap.
The new lithography systems will be used to manufacture the Exynos 2600 SoC and Tesla's next-generation AI accelerator.
Author's summary: Samsung advances its semiconductor manufacturing with ASML's High-NA EUV lithography.
More News
- Texas faces heightened wildfire threat amid ongoing drought
- Adams, Ejuke Fail To Help Sevilla Close Gap On Madrid After Defeat To Mallorca
- Maintaining egg production during cold months - High Plains Journal
- How Creators Changed Nobody Wants This Season Two For Adam Brody and Leighton Meester
- Chelsea enjoy thumping win at Forest - West London Sport
- 4 weird driving myths that are actually dangerous, plus 1 that's just stupid
- The 5 Biggest State Tax Cuts for Millionaires this Year
- Dan's Daily: Jagr Back; Team USA Makes Demands; Penguins Changes
- Inside the Chicago Resistance
- Solar, wind projects redefine Azerbaijan’s energy economy